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Offset Plate With Good Resistance To Press Chemicals

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Product Category :    Plates

Supplier                :    Technova Imaging Systems (P) Limited

Key Features of Offset Plate with Good Resistance to Press Chemicals

  • Computerised Laser Inspection System ensures supply of defect-free plates
  • Each plate carries a printed identification number for quality assurance
  • Excellent colour change after exposure


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Product Profile of Offset Plate with Good Resistance to Press Chemicals

TechNova Imaging Systems [P] Limited offers Offset Plate with Good Resistance to Press Chemicals. TechNova Imaging Systems [P] Limited is an ISO 9001:2000 awarded company. The company manufactures imaging products like with full range of digital offset plates like violet, thermal, UV, inkjet and laser-printer. The company also manufactures offset printing plates; laser, inkjet and graphic art films; chemicals; offset inks; offset blankets, flexo plates and related products; inkjet, laser and drafting media. The Offset Plate with Good Resistance to Press Chemicals comes under the brand name "Cronos" is a high-speed pre-sensitised positive-working medium run plate designed for optimum productivity with CtCP imaging. Cronos is produced with the latest technology for reproducing the smallest dots and the sharpest lines.

Key Features of Offset Plate with Good Resistance to Press Chemicals
  • Computerised Laser Inspection System ensures supply of defect-free plates
  • Each plate carries a printed identification number for quality assurance
  • Excellent colour change after exposure
  • Wide exposure and development latitude
  • Very strong image contrast makes deletion very easy
  • High-resolution of the plate allows even the smallest dots & the sharpest lines to be retained
  • Very good resistance to alcohol and press chemicals.
Product Specification of Offset Plate with Good Resistance to Press Chemicals
  • Gauge:0.28, 0.30 mm
  • Micro-lines Resolution:10 microns
  • Plate Type:Positive-working
  • Safe Light:Yellow
  • Spectral Sensitivity:360 - 420 nm
  • Substrates:Litho-grade aluminium, electrochemically grained and anodised
  • Width:1500 mm ( Maximum)
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