Industrial Grade Planer Sputtering Equipment has assemblies with rare earth magnets for good target utilization. The Equipment has quartz infrared lamp based substrate heating up to 250 ° C. The Equipment has closed loop pressure control electronics for precise process pressure control during sputtering and has precision mass flow controller for process consistency. The Equipment has PLC/ PC based automation with recipe programming, alarm management and trends/ report generation. The Industrial Grade Planer Sputtering Equipment ensures substrate rotation from 10 to 30 rpm along with change of sources to substrate distance.
