RF Sputtering System with High Vacuum Pumping Module is provided with turbo pump and high vacuum chamber with top and bottom demountable flanges for sputtering and glow discharge. The Sputtering System is available with chamber which is bakeable to 1500 C and compatible to vacuum in the range of 10-7 Mb. The Sputtering System is highly efficient and delivers hassle free performance. RF Sputtering System with High Vacuum Pumping Module is strong and rigid in construction and is completely energy efficient in nature.
