Product Profile of Industrial Wafer/ Mask Cleaner Unit

Industrial Wafer/ Mask Cleaner Unit is designed for damage-free mega sonic and chemical cleaning applications. The Wafer/ Mask Cleaner Unit enables cleaning of the diced chips on wafer frame and after plasma etching or photo resist stripping. The Wafer/ Mask Cleaner Unit enables Mega sonic agitation to enhance lift-off process. The Industrial Wafer/ Mask Cleaner Unit also facilitates patterned or un-patterned wafer cleaning.

Applications of the Industrial Wafer/ Mask Cleaner Unit:

• Patterned or Un-patterned Wafer Cleaning

• Ge, GaAs and InP Wafer Cleaning

• Post CMP Wafer Cleaning

• Cleaning of the Diced Chips on Wafer Frame

• Cleaning after Plasma Etching or Photo resist Stripping

• Cleaning after Lapping and prior to Bonding

• Cleaning of X-ray Masks, EUV Masks, Templates

• Pelliclized Reticle Cleaning

• Cleaning of Mask Blanks

• Cleaning Contact Masks

• Cleaning of the ITO coated Display Panels

• Cleaning of Ceramic Substrates with laser drilled holes

• Optical Lens Cleaning

• Mega sonic agitation to enhance Lift-off Process