Cylindrical Rotatable Sputter Target is used in PVD processes which ensure coating by physical vapour deposition for both horizontal and vertical applications. The Sputter Target comprises of various features like faster coating deposition, higher coating material utilization etc. The Sputter Target is made using quality grade raw material which ensures durability of use along with long lasting trouble free service. Cylindrical Rotatable Sputter Target ensures ease of use and maintenance.
