Product Profile of Liquid Photoimagable Etch Resist - LPIR
Atotech India Ltd. Supplies Liquid Photoimagable Etch Resist - LPIR. The quality management system of Atotech India Ltd. Is ISO 9001 and ISO 14001 registered. Liquid Photoimagable Etch Resist - LPIR is designed with robustness and process tolerance in order to support excellent first pass yields. Liquid Photoimagable Etch Resist - LPIR provides excellent performance within wide processing windows. It is suitable for high throughput / high yield inner layer manufacturing.
Key Features of Liquid Photoimagable Etch Resist - LPIR
- High contrast for sharpest line definition
- Homogeneous film formation allowing perfect hard contact at exposure
- Rapid exposure, with wide exposure tolerance, allowing low energy at exposure, ease of frame cooling and thereby highest registration accuracy
- A hard and tough exposed film, able to withstand the rigors of DES transport and handling
- Rapid developing in short chambers within wide process tolerance achieving fine line structuring with minimized process investments
- Endless resistance to acid etch ants without scum formation
