Rapid Type Thermal Processor is capable of high power density illumination built using halogen lamps and is provided with high vacuum facility along with gas injection system including number of gases. The Processor has capability to reach 1100 ° c on silicon wafer and has temperature ramp rates of 150 ° c/ sec. The Processor has double walled stainless steel made chamber for hot zone with water cooling facility and requires less maintenance. The Rapid Type Thermal Processor has closed loop PID mode and intensity controlled mode operation and safety interlocks for door and water flow.
